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  6. 3M™ CMP Pad Conditioner Brush

3M™ CMP Pad Conditioner Brush

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Durable brush bristles assist with removal of pad debris from microreplicated, porometric and felt-based pads

Easy connection to polishing tool end effector

Exclusive polymer substrate enhances corrosion resistance

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Frequently viewed resources
PDF (1) Copy 26Tech Data Sheet (PDF, 373KB)

Details

Highlights
  • Durable brush bristles assist with removal of pad debris from microreplicated, porometric and felt-based pads
  • Easy connection to polishing tool end effector
  • Exclusive polymer substrate enhances corrosion resistance
  • Efficient pad cleaning and slurry distribution helps enable low cost of ownership

Engineered CMP pad conditioner brushes are designed for critical semiconductor buff CMP applications.

Specifications

Resources

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